Abstract
In this study, electrodeposition of copper nanoparticles from its soluble hydrated chloride salt in ammonium Alum: urea deep eutectic solvent (DES) of 1:5 mole ratio was investigated. The electrochemical reduction of the Cu (II)/Cu (0) couple was found to be a quasi-reversible reaction, with a broad reduction peak at –0.2 V as revealed by cyclic voltammetry. The hydrated copper chloride stabilized the electro-reduction process within the DES. Scanning electronic microscope (SEM) showed copper metal was electroplated as nano particles 35 to 49 nm agglomerated as Cauliflower on mild steel. Energy dispersive X-ray spectrometry (EDX) X-ray, analyses (XRD) and visually showed the brown smooth good adhesive layer of copper on mild steel substrate. The analysis of atomic force microscopy analysis (AFM) indicates a roughness value (Ra) of 17.58 nm of 789.6 nm calculated average height. X-ray diffraction measurement indicated the brown smooth deposited layers to be pure crystalline Cu structures with crystallographic orientation at Cu (111), Cu (200) and Cu (220). These findings demonstrate the effectiveness of using ammonium alum DES for the electrodeposition of high-quality copper coatings.
Keywords
Ammonium Alum: urea, Copper nanoparticles, Cyclic voltammetry, Deep eutectic solvent (DES), Electrodeposition
Subject Area
Chemistry
Article Type
Article
First Page
4003
Last Page
4012
Creative Commons License

This work is licensed under a Creative Commons Attribution 4.0 International License.
How to Cite this Article
Shamkhy, Eman Turky; Abood, Hadi M A; and Salman, Taghried A.
(2025)
"Nano Copper Metal Electrodeposited on Mild Steel From Dissolved Hydrated Copper Chloride in Deep Eutectic Solvent,"
Baghdad Science Journal: Vol. 22:
Iss.
12, Article 7.
DOI: https://doi.org/10.21123/2411-7986.5158
