Abstract
The electrical properties of the AlNiCo thin films with thickness (1000oA) deposited on glass substrates using Ion – Beam sputtering (IBS) technique under vacuum <10-6 torr have been studied . Also it studied the effect of annealing temperature fromthis films , It is found that the effective energy decrease with increase of temperature and the conductivity decrease with increase temperature 323oK but after this degree the conductivity increasing .
Article Type
Article
How to Cite this Article
Al-Ani, T.K.
(2007)
"Study of the electrical properties of Ion Beam Sputtered thin AlNiCo films,"
Baghdad Science Journal: Vol. 4:
Iss.
2, Article 13.
DOI: https://doi.org/10.21123/bsj.2007.4.2.260-262
COinS
