Plasma Spectroscopy Diagnostics of V2O5 at a Variable of Operating Power and Pressure With Radio Frequency Magnetron Sputtering.

Abstract

   In this paper, we investigate the basic characteristics of "magnetron sputtering plasma" using the target V₂O₅. The "magnetron sputtering plasma" is produced using "radio frequency (RF)" power supply and Argon gas. The intensity of the light emission from atoms and radicals in the plasma measured by using "optical emission spectrophotometer", and the appeared peaks in all patterns match the standard lines from NIST database and employed are to estimate the plasma parameters, of computes electron temperature and the electrons density. The characteristics of V₂O₅ sputtering plasma at multiple discharge provisos are studied at the "radio frequency" (RF) power ranging from 75 - 150 Watt and gas pressure (0.03, 0.05 and  0.007) torr.  One can observe that the intensity of the emission lines increases with increasing the sputtering power. We find that the electron temperature excess drastically from 0.95 eV to 1.11eV when the emptying gas pressure excess from 0.03 to 0.05 Torr. On other hand excess electron temperature from 0.9 to 1.01 eV with increasing sputtering power from 100 to 125 Watt, while the electron density decrease from 5.9×10¹⁴ to 4.5×10¹⁴ cm^-3 with increasing sputtering power. and electron density decrease with increasing of pressure from 4.25×10¹⁴ to 2.80×10¹⁴ cm^-3, But the electron density maximum values  5.9×10¹⁴ at pressure  0.03 Torr.